What are the Differences Between 32nm Technology and 45nm Technology?

What are the Differences Between 32nm Technology and 45nm Technology?

32nm Technology vs 45nm Technology

32nm Technology and 45nm Technology are the terms used in Semiconductor manufacturing. nm means nanometer. Big Giants like Intel, AMD uses these technology in building Processors. Both are used in the processors. Knowing the Difference between 32nm Technology and 45nm Technology will definitely help understand their role in the Processors. Below you will learn the differences between them.

32nm Technology

1.     32 nm Technology – Flash patterning capability based on double patterning and immersion lithography was first demonstrated in October 2006.
2.     32 nm refers to the expected average half-pitch of a memory cell at this technology level.
3.     Intel demonstrated 32 nm processor in February 10, 2009 and started selling it on January 7, 2010 as Core i3, Core i5 and Dual Core mobile i7 processors.
4.     32nm Technology is the successor of 45nm Technology.
5.     32 nanometer process for logic, which uses significantly looser design rules.
6.     Successor of 32nm Technology will be 22nm Technology and 16nm Technology.

45nm Technology

    45 nm Technology – Flash patterning capability based on double patterning and immersion lithography was first demonstrated in October 2006.
    45 nm refers to the expected average half-pitch of a memory cell at this technology level.
    Matsushita and Intel started using 45 nm chips in late 2007, where as AMD started production in 2008. Intel’s Core i7 and Core i3 processors uses 45nm Technology.
    45nm Technology is the successor of 65nm Technology.
    45 nanometer process for logic, which uses significantly looser design rules.
    Successor of 45nm Technology is 32nm Technology.

Semiconductor manufacturing processes 

    10 µm — 1971
    3 µm — 1975
    1.5 µm — 1982
    1 µm — 1985
    800 nm (.80 µm) — 1989
    600 nm (.60 µm) — 1994
    350 nm (.35 µm) — 1995
    250 nm (.25 µm) — 1998
    180 nm (.18 µm) — 1999
    130 nm (.13 µm) — 2000
    90 nm — 2002
    65 nm — 2006
    45 nm — 2008
    32 nm — 2010
    22 nm — 2011
    16 nm — approx. 2013
    11 nm — approx. 2015